Loading
Loading…
Loading…
| # | Company | Amount | Rank | Status |
|---|---|---|---|---|
| 1 | L1₹2.4 CrAdmitted-Finance NO 2 13 1ST PHASE PEENYA INDUSTRIAL AREA PEENYA BANGALORE KARNATAKA 560058 | BENGALURU URBAN | KARNATAKA | 560058 | ₹2.4 Cr | L1 | Admitted-Finance |
| 2 | L2₹2.8 Cr+₹41.8 L (17.3%)Admitted-Finance 49 3 49 4 OPP BHARAT BENZ SHOWROOM THONCHINAKUPPE VILLAGE NELAMANGALA TALUK BANGALORE RURAL KARNATAKA 562123 | BENGALURU RURAL | KARNATAKA | 562123 | ₹2.8 Cr+₹41.8 L (17.3%) | L2 | Admitted-Finance |
| Sl No | Description | Qty | Unit | VACUUM TECHNIQUES PVT LTD L1 | RANVAC Technologies L2 |
|---|---|---|---|---|---|
| 1.01 | UHV Chamber Specification (vacuum better than 2×10-9 mbar UHV) Chamber Overview Spherical (diameter ≥ 14”) or equivalent square shaped UHV chamber with support frame equipped with three (3) X 2-inch magnetron sputtering sources. All CF Flanges and UHV Viewports/SS blanks | 1 | Nos. | 2,15,000 ₹2,53,700 Lowest | 13,00,000 ₹15,34,000 |
| 1.02 | Three (3) X 2-inch magnetron sputtering sources. Each sputtering source has an individual gas inlet line for process gases. All CF Flanges. | 3 | Nos. | 12,00,000 ₹14,16,000 Lowest | 16,50,000 ₹19,47,000 |
| 1.03 | Substrate holder : Diameter: 2 inches; heating Molybdenum heater capable of heating substrate (a) from room temperature (RT) to 800°C during rotation and (b) from room temperature to 1000°C without rotation. Rotation: Substrate holder can rotate continuously, driven by a stepper motor. Variable speed from 0 to 10 RPM
Movement: Up / down vertical movement of total 25mm to adjust substrate position during deposition Sputtering geometry: One sputtering source mounted parallel to the substrate surface, tilt adjustable. Two sputtering sources mounted confocally at an angle relative to the substrate. Base pressure: lower than 2 × 10⁻⁹ mbar (ultra-high vacuum). | 1 | Nos, | 14,00,000 ₹16,52,000 | 7,00,000 ₹8,26,000 Lowest |
| 1.04 | Vacuum Pumping System: Turbo Molecular Pump: Pfeiffer HiPace300 / Edwards nEXT 300 / Leybold Turbovac 350i with CF100 flange or equivalent with integrated controller | 1 | Nos. | 5,00,000 ₹5,90,000 Lowest | 6,20,000 ₹7,31,600 |
| 1.05 | Ion Pump with controller: Included to maintain UHV vacuum levels and provide clean pumping. | 1 | Nos. | 9,50,000 ₹11,21,000 | 5,50,000 ₹6,49,000 Lowest |
| 1.06 | Backing Pump: Pfeiffer HiScroll 12 / Edwards nXDS 15i / Leybold scroll VAC 15 plus or equivalent dry scroll pump used to back TMP | 1 | Nos. | 3,75,000 ₹4,42,500 | 3,50,000 ₹4,13,000 Lowest |
| 1.07 | Gate Valves : One CF100 and one CF150 manual Gate valves for isolating the chamber from the pumping systems as well as throttling | 2 | Nos. | 11,00,000 ₹12,98,000 | 9,60,000 ₹11,32,800 Lowest |
| 1.08 | Vacuum Gauges and Measurement: One Cold cathode gauge with readout capable of measuring vacuum pressures down to1×10-10 mbar for precise UHV monitoring. | 1 | Nos. | 2,50,000 ₹2,95,000 | 2,20,000 ₹2,59,600 Lowest |
| 1.09 | One Capacitance manometer gauge with measurement range from 1× 10-1 to 1 × 10⁻³ mbar for accurate pressure reading during deposition phase | 1 | Nos. | 2,85,000 ₹3,36,300 | 2,20,000 ₹2,59,600 Lowest |
| 1.10 | Gas Delivery System: Two independent Mass Flow Controllers (MFCs):
a. One MFC (0-100 sccm) for Argon gas feeding to all three sputtering sources via high vacuum valves.
b. One MFC (0-100 sccm) for Nitrogen gas feeding directly into the chamber with its own high vacuum valve.
Gas lines for Ar and N2 are physically separated to avoid cross-contamination. | 2 | Nos. | 2,50,000 ₹2,95,000 | 2,00,000 ₹2,36,000 Lowest |
Tender Value
Refer Docs
EMD Value
₹5.1 L
Closing Date
23 Jun 2026, 3:00 pmClosed
Sr. Controller of Stores and Purchase
Room NO. 160, Purchase Branch, CSIR-NPL
UHV Deposition Chamber 14-VII/SS(3063-OTE)25PB/T-08
2026_CSIR_278157_1
14-VII/SS(3063-OTE)25PB/T-08
Open Tender
Laboratory and scientific equipment
Supply
120 days
Room NO. 160, Purchase Branch, CSIR-NPL
Please refer to tender document
7 documents required · 7 mandatory
₹0
₹5.1 L
Yes
ONLINE
22 Jul 2026
20 May 2026
24 Jun 2026
20 May 2026
23 Jun 2026
8 Jun 2026
20 May 2026 - 25 May 2026
26 May 2026
| Sl No | Description | Qty | Unit | Est. Rate | Est. Amount |
|---|---|---|---|---|---|
| 1.01 | UHV Chamber Specification (vacuum better than 2×10-9 mbar UHV) Chamber Overview Spherical (diameter ≥ 14”) or equivalent square shaped UHV chamber with support frame equipped with three (3) X 2-inch magnetron sputtering sources. All CF Flanges and UHV Viewports/SS blanks | 1 | Nos. | - | - |
| 1.02 | Three (3) X 2-inch magnetron sputtering sources. Each sputtering source has an individual gas inlet line for process gases. All CF Flanges. | 3 | Nos. | - | - |
| 1.03 | Substrate holder : Diameter: 2 inches; heating Molybdenum heater capable of heating substrate (a) from room temperature (RT) to 800°C during rotation and (b) from room temperature to 1000°C without rotation. Rotation: Substrate holder can rotate continuously, driven by a stepper motor. Variable speed from 0 to 10 RPM
Movement: Up / down vertical movement of total 25mm to adjust substrate position during deposition Sputtering geometry: One sputtering source mounted parallel to the substrate surface, tilt adjustable. Two sputtering sources mounted confocally at an angle relative to the substrate. Base pressure: lower than 2 × 10⁻⁹ mbar (ultra-high vacuum). | 1 | Nos, | - | - |
| 1.04 | Vacuum Pumping System: Turbo Molecular Pump: Pfeiffer HiPace300 / Edwards nEXT 300 / Leybold Turbovac 350i with CF100 flange or equivalent with integrated controller | 1 | Nos. | - | - |
| 1.05 | Ion Pump with controller: Included to maintain UHV vacuum levels and provide clean pumping. | 1 | Nos. | - | - |
| 1.06 | Backing Pump: Pfeiffer HiScroll 12 / Edwards nXDS 15i / Leybold scroll VAC 15 plus or equivalent dry scroll pump used to back TMP | 1 | Nos. | - | - |
| 1.07 | Gate Valves : One CF100 and one CF150 manual Gate valves for isolating the chamber from the pumping systems as well as throttling | 2 | Nos. | - | - |
| 1.08 | Vacuum Gauges and Measurement: One Cold cathode gauge with readout capable of measuring vacuum pressures down to1×10-10 mbar for precise UHV monitoring. | 1 | Nos. | - | - |
| 1.09 | One Capacitance manometer gauge with measurement range from 1× 10-1 to 1 × 10⁻³ mbar for accurate pressure reading during deposition phase | 1 | Nos. | - | - |
| 1.1 | Gas Delivery System: Two independent Mass Flow Controllers (MFCs):
a. One MFC (0-100 sccm) for Argon gas feeding to all three sputtering sources via high vacuum valves.
b. One MFC (0-100 sccm) for Nitrogen gas feeding directly into the chamber with its own high vacuum valve.
Gas lines for Ar and N2 are physically separated to avoid cross-contamination. | 2 | Nos. | - | - |
stage.html
html • 0.03 MB
tech_eval.pdf
boq_comp_chart.xlsx
xlsx
Tap a document below to read it instantly. You can also download everything as a ZIP if you prefer.
details.html
html • 0.04 MB
Tendernotice_1.pdf
PDF • 1.02 MB
OTEBIDOCUMENT3063.pdf
Tender Documents • 1.87 MB
BOQ_324801.xls
BOQ • 0.33 MB
NIT3063.pdf
Additional Documents • 1.00 MB
CORRIGENDUMREVSPECS3063.pdf
PDF • 0.56 MB
Download all tender documents and submit your bid
Disclaimer: TenderKart has made every reasonable effort to ensure that the information on this page is accurate and authentic, however it cannot be held liable for any third-party claims or losses or any damages. TenderKart makes no warranty, expressed or implied, as to the results obtained from the use of this information. If you notice any error or omission, please let us know at .