Procurement of Plasma Enhanced Chemical Vapor Deposition (PECVD), Inductive Coupled Reactive Ion Etching (ICP-RIE-F) and required utilities on turn key basis

Main Item:

Plasma Enhanced Chemical Vapor Deposition (PECVD), Inductive Coupled Reactive Ion Etching (ICP-RIE-F) and required utilities on turn key basis (inclusive of 1 year Comprehensive warranty for both PECVD and ICE-RIE-F system) (for details refer Annexure-I). The bidder has to quote a single price for both PECVD and ICE-RIE-F system combined.

Optional Item:

AMC for 5 years (after completion of 1 year warranty) Bidder to quote aggregate cost for 5 years

One 8x8 Semi-Auto changeover manifold for CDA

Spare Parts (refer Point no. 7 of Scope of Work for shared utilities for PECVD and ICE-RIE-F system)